"My research group studies structural and electronic properties of thin film systems on metal and semiconductor surfaces as well as internal interfaces using atomic scale electron scattering experiments. Through various preparation methods, we fabricate layered systems and low-dimensional structures. In such systems, the atomic and electronic structure of the system is very sensitive to minute changes, such as the variation of the layer thickness, which we can precisely control down to a fraction of an atomic layer. At the university's own 1.5 GeV electron storage ring DELTA, we operate a dedicated beamline for the use of soft X-rays. The UHV experimental chamber connected there can be used, for example, to perform high-resolution XPS and XPD measurements. Currently, this apparatus is being extended by helium cooling to 10 K. In addition to X-rays, UV radiation is also used for UPS and ARPES measurements. Complementary to spectroscopy, we use a tunneling microscope to analyze the topography of surfaces, supported by LEED and PEEM studies."